| # | Title | Type | Language | |||||||||||
| 1. | MA6/BA6 Mask Aligner Equipment Standard Operating Procedure a a Date Created May 3 2004 Date Modified June 1 2005 MA6 BA6 Mask Aligner Equipment Standard Operating Procedure Greg Allion and Kimberly Appel 1 Purpose 1 1 Photolithography involves transferring a pattern from a mask to a wafer coated with photo resist 1 2 MA6 has the capability of processing both top and backside alignment 1 3 This tool is primarily used for high resolution lithography lt 2um and or critical alignment tolerances lt 1um 2 Ref |
PDF Manual | ENGLISH | |||||||||||
| # | Title | Type | Language | Download | ||||||||||
| 1. | MA6/BA6 Mask Aligner Equipment Standard Operating Procedure a a Date Created May 3 2004 Date Modified June 1 2005 MA6 BA6 Mask Aligner Equipment Standard Operating Procedure Greg Allion and Kimberly Appel 1 Purpose 1 1 Photolithography involves transferring a pattern from a mask to a wafer coated with photo resist 1 2 MA6 has the capability of processing both top and backside alignment 1 3 This tool is primarily used for high resolution lithography lt 2um and or critical alignment tolerances lt 1um 2 Ref |
PDF Manual | ENGLISH |
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