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Quintel Mask Aligner
Marvell Nanofabrication Laboratory University of California Berkeley Berkeley Microfabrication Laboratory ae Lab Manual HE Marvell NanoLab Member login Lab Manual Contents MercuryWeb Berkeley Microlab 1 0 2 0 3 0 4 0 5 0 Chapter 4 16 Quintel Mask Aligner quintel 382 Title Quintel Q4000 Mask Aligner Purpose The Quintel Q4000 MA Mask Aligner is a top and bottom side contact lithography printer with the video view split field microscope used for fine line lithography down to 1 micron or better It is capable of processing both 4 and 6 inch substrates using 7 photomasks The quintel was recently modified to accept 6 wafers while retaining the ability for 4 wafers and smaller substrates This modification duplicates many of the contact and proximity photolithography capabilities of the ksaligner allowing NanoLab member access to two contact printers and provides a backup when one aligner is down for maintenance or repairs Modifications included a new 6 chuck and a new mask plate while keeping the 4 chuck The new mask plate requires a 7 mask which matches the ksaligners mask requirements The quintel retains its IR light source and cameras for through wafer backside alignment for 6 wafers The previously used mask clamp has been obviated by this modification and is no longer available or needed After reading this manual the user should be able to describe a typical MA quintel process for both top and backside alignment explain the theory of operation and state all hazards associated with the system After successfully completing the qualification procedures for this tool see Appendix 12 2 the user should be able to perform a full photolithography process for both TSA and BSA using this system Only trained and approved qualified Users may use this tool Scope The mask aligner consists of several coordinated inter related systems including 3 1 Substrate loading holding and unloading system 3 2 The mask supporting system 3 3 The substrate mask scan align lock system 3 4 The viewing system microscope and illuminators 3 5 The exposing system 3 6 Use 7 inch masks Applicable Documents Revision History Quintel Q4000 Operating Manual Manufacturer hardcopy is located in the Microlab office Definitions amp Process Terminology All the front panel controls are push on push off buttons with indicator lamps The buttons are illuminated green when an option is active 5 1 MASK VACUUM Turns vacuum on off to affix mask to mask chuck 5 2 LOAD CLEAR Raises the wafer chuck 5 3 CLEAR Lowers the wafer chuck quintel Chapter 4 16 5 4 SEP CONTACT When a wafer is loaded the chuck will planarize with the mask and then lower out of contact for alignment Contact is selected to put the wafer back into contact with the mask after alignment and before exposing Lights illuminate to indicate which mode is act |
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